Research of Aluminum Oxynitride Thin Films Deposited by Ion Beam Sputtering
碩士 === 輔仁大學 === 物理學系 === 95 === Aluminum Oxynitride thin films(AlOxNy) exhibit high transmittance, high resistivity, variable refractive index(2.1~1.68) and high energy gap(＞6.2). The method of ion beam assisted deposition (IAD) has been wildly used in the AlOxNy thin films deposition process due to...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/10545116537026670287 |