Deposition Rate and Thermal Annealing Influences on Optical and Microstructural Evoiution of HfO2-SiO2 Mixed Thin Films

碩士 === 義守大學 === 材料科學與工程學系碩士班 === 95 === The improvement of coating equipment has resulted in the processes of graded-index thin film become to be more easily fabricated and the design of graded-index optical thin film is also considered to be the candidate application in the opto-electronic industri...

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Bibliographic Details
Main Authors: Yung-chih Su, 蘇詠智
Other Authors: Wen-jen Liu
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/89229871913461800660