Study of the two step sputtering aluminum nitride thin films on Mo bottom-electrode Layer
碩士 === 明志科技大學 === 化工與材料工程研究所 === 97 === This thesis is to make piezoelectric aluminum nitride (AlN) films for applications to thin film bulk acoustic resonator (FBAR), using pulsed-DC reactive sputtering. Such films have to be highly (002)-textured with a narrow enough rocking curve, with a well-con...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/45542296656948934310 |