Study on the Reliability of Hydrogenated Amorphous Silicon Thin Film Transistors under AC Gate and Drain Bias Stress

碩士 === 中興大學 === 電機工程學系所 === 95 === In this paper, we investigate the reliability of asymmetric a-Si:H TFTs with three mask process. And we study the instability mechanisms of a-Si:H TFTs under alternating current (AC) and direct current (DC) bias stress. This thesis can be divided into two major par...

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Bibliographic Details
Main Authors: Chung-Wei Yang, 楊中維
Other Authors: Han-Wen Liu
Format: Others
Language:zh-TW
Online Access:http://ndltd.ncl.edu.tw/handle/57482057510563293735