The Transferred Pattern without Residual Layer of Polymer by Improved Reversal Imprinting Process

碩士 === 國立成功大學 === 化學工程學系碩博士班 === 95 === Nowadays, the semiconductor industry is in full swing to pursue the miniaturization of electronic devices. However the most colossal difficulty is right in patterning technologies which used to carry out nanoscale patterns on resist material. Nanoprinting is a...

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Bibliographic Details
Main Authors: Jun-Yang Sie, 謝竣仰
Other Authors: Franklin Chau-Nan Hong
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/16278606589206684776