Low-Temperature C-V、I-V and Post-stress Behaviors of HfSiON and HfAlON High-K Dielectrics
碩士 === 國立暨南國際大學 === 電機工程學系 === 95 === The main purpose of this thesis is to study the low-temperature behaviors of two most promising high-k dielectrics, HfSiON and HfAlON, by measuring their capacitance-voltage (C-V) and current-voltage (I-V) characteristics at low temperatures, such that we can un...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/19009341310992179879 |