Effects of Additives on Filling Performance in Copper Electroplating and Conformal Copper Deposition in High-Aspect Ratio Trenches by Electroless Plating

碩士 === 國立交通大學 === 材料科學與工程系所 === 95 ===

Bibliographic Details
Main Author: 羅世儒
Other Authors: 吳樸偉
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/44429328041486977943