The Study of Reoxidation Mechanism on High Nitrogen Content Ultrathin Oxynitirde and Novel Film Process Development
博士 === 國立交通大學 === 電子工程系所 === 95 === In this dissertation, we report that reoxidation behavior of high-nitrogen ultrathin oxynitride in rapid thermal process (RTP). Simultaneously, we develop a novel process to grow robust ultrathin oxynitride with high nitrogen content close to its surface. Reoxidat...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/61229771362407162702 |