Study of Carrier Transport and Negative Bias Temperature Instability (NBTI) of Nanoscale Process-Strained Si (PSS) CMOSFETs
博士 === 國立交通大學 === 電子工程系所 === 95 === In this dissertation, we primarily investigate the impact of process-induced uniaxial strain of CMOSFETs on low-field carrier transport and high-field channel backscattering phenomenon. By utilizing the temperature power-dependence of drain current, we can deduce...
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| Format: | Others |
| Language: | en_US |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/45733634265399167469 |