The research of nitrogen doped titanium dioxide fabricated by pulsed DC magnetron sputtering
碩士 === 國立中央大學 === 光電科學研究所 === 95 === This research is separated into two parts. In the first part, the main purpose of this research is titanium dioxide thin film deposited on glass substrate with pulsed DC reactive sputterring system. The various parameters include three different parts: heating te...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/68917773669988522008 |