Electrodeposited copper thin films on ITO/Si substrate for copper metallization
碩士 === 國立屏東科技大學 === 材料工程所 === 95 === In this work, we use electrodepositing copper to take the place of sputtering copper in copper metallization. First, we use different thickness of ITO to be cathode sample, and electrodeposited copper film in different time. Last, we observe the heat stability of...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/10526803229143233062 |