Silicon and Silicon Nitride Prepared by Ratio-frequency magnetron sputtering on Silicon and Glass substrates
碩士 === 國立中山大學 === 光電工程研究所 === 95 === Silicon and silicon nitride thin films were growth on Si and glass substrates at room temperature by ratio-frequency (r-f) magnetron sputtering. The electrical characteristics of the silicon nitride films were characterized using I-V and C-V measurement under dif...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/xd7zuf |