Applications of E-Beam Lithography to the Fabrication of Photonic Crystal Microcavity and DBR Laser
碩士 === 國立中山大學 === 光電工程研究所 === 95 === In this thesis, we use E-Beam lithography to finish the process of DBR laser, 2D Photonic crystal, and Metallic nanoelectrodes. We use the new E-Beam system to define array patterns. By this test, we obtain the minimum linewidth of 50nm, and the maximum working r...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/ss7yh7 |