Applications of E-Beam Lithography to the Fabrication of Photonic Crystal Microcavity and DBR Laser
碩士 === 國立中山大學 === 光電工程研究所 === 95 === In this thesis, we use E-Beam lithography to finish the process of DBR laser, 2D Photonic crystal, and Metallic nanoelectrodes. We use the new E-Beam system to define array patterns. By this test, we obtain the minimum linewidth of 50nm, and the maximum working r...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2007
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Online Access: | http://ndltd.ncl.edu.tw/handle/ss7yh7 |