Effect of Ga to N flux ratio on the GaN surface morphologies grown by plasma-assisted molecular-beam epitaxy

碩士 === 國立中山大學 === 物理學系研究所 === 95 === We mainly studied the morphology of GaN structures which were grown by plasma-assisted molecular beam epitaxy. The only condition we changed is Ga/N Ratio. Based on observation of reflection high energy electron diffraction (RHEED) patterns, we found all samples...

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Bibliographic Details
Main Authors: Yao-i Chang, 張燿一
Other Authors: Ikai Lo
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/s5r637