High-κ dielectrics on germanium MOS - XPS and electrical characteristics

碩士 === 國立清華大學 === 材料科學工程學系 === 95 === Germanium with its electron and hole mobility almost three and four times of those in Silicon, respectively, is now being considered as a high mobility channel to replace Si. However, the native oxides due to their poor thermal stability have been attributed to...

Full description

Bibliographic Details
Main Authors: Chi-Hsin Lee, 李奇勳
Other Authors: Minghwei Hong
Format: Others
Language:en_US
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/30255318357462513958