Heat Treatment Induced Phase Separation and Phase Transformation of Zr(N,O) Thin Films by Ion Plating
碩士 === 國立清華大學 === 工程與系統科學系 === 95 === Nanocrystalline Zr(N,O) thin films, consisting of ZrN and monoclinic ZrO2 were successfully deposited on p-type Si (100) substrates using hollow cathode discharge ion-plating (HCD-IP) system. With the increase of oxygen flow rate ranging from 0 to 10 sccm, the p...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/41023669365821249995 |