3D X-RAY LITHOGRAPHY FOR HARD X-RAY OPTICS
碩士 === 國立臺灣海洋大學 === 光電科學研究所 === 95 === ABSTRACT The modern lithography methods such as e-beam and UV lithography are not suitable to produce three dimensional (3D) structures. However, there is obvious advantage in both device function and density to produce structure with 3D characteristics and th...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/58771824277296359589 |