Study of 2-D and 3-D Nanosphere Lithographyfor Optoelectronic Device and Sensor Applications
碩士 === 臺灣大學 === 材料科學與工程學研究所 === 95 === Nanosphere lithography (NSL) is a novel method for the fabrication of hexagonal close-packed structures by self-assembly monolayer nanosphere array on flat substrates. Here the monolayer nanospheres are taked as etching mask layer like patterned resists. Furthe...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/31610052764531936539 |