Focusing Properties of Optical Wave in Dielectric Nanostructures and Its Application in Photolithography
博士 === 國立臺灣大學 === 物理研究所 === 95 === We develop a near-field photomask lithographic method to fabricate high quality subwavelength patterns. This method uses edge-diffracted beams occur at the edges of subwavelength dielectric structures. According to finite-difference time-domain (FDTD) calculations...
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| Format: | Others |
| Language: | en_US |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/67875143964889679975 |