Fabrication of Nano-Array Structure by Using Nanoimprint Lithography
碩士 === 國立臺灣大學 === 物理研究所 === 95 === Before long, it could come true that nanoimprint lithography will replace photolithography in semiconductor manufacture and nano technology. After Stephen Y. Chou, related technologies proposed by C. G. Wilson and G. M. Whiteside make it more possible. One reason i...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/28961015871711653478 |