Process-Variation Statistical Modeling for VLSI Timing Analysis
碩士 === 臺灣大學 === 電子工程學研究所 === 95 === As the technology feature sizes are getting smaller than the wave length of optical lithography light source, the process variation issues are also getting significant and must be taken into consideration during design. Classical corner-based timing analysis produ...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/00328362658856014549 |