Mechanical Properties of Silicon Dioxide Film Deposited by Atmospheric Pressure Plasma Chemical Vapor Deposition
碩士 === 國立臺灣大學 === 機械工程學研究所 === 95 === Atmospheric pressure plasma jet (APPJ) chemical vapor deposition (CVD) technique is utilized in this paper. The jet operates by feeding nitrogen gas between two electrodes that driven by a 20 kHz frequency and 500 W power source at atmospheric pressure and near...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/85781919887774858894 |