Growth of p-GaN film by adding gallium trichlorideas H scavenger in MOCVD system

碩士 === 國立臺灣科技大學 === 化學工程系 === 95 === p-GaN thin films were grown in three different ambient gases using TMGa, Cp2Mg and NH3 as Ga, Mg and N source, respectively. First, in H2 free ambient and growth pressure of 75 torr, p-GaN thin films had smoother surface, but the electrical properties film couldn...

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Bibliographic Details
Main Authors: Yun-hsuan Chang, 張運旋
Other Authors: Lu-Sheng Hong
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/d75fs5