Growth and Characterization of ZnO Thin Films by Chemical Vapor Deposition
碩士 === 國立臺灣科技大學 === 電子工程系 === 95 === ZnO thin films were deposited on Si substrate by CVD utilizing a combination of argon and oxygen as the carrying gas in a horizontal tube furnace. The effect of thermal annealing on the ZnO films is investigated. ZnO thin films were analyzed using field-emissio...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/x4pe23 |