Investigation on the Performance Improvement of Multi-Channel Poly-Si TFT with Rapid Thermal Annealing
碩士 === 國立臺灣科技大學 === 電子工程系 === 95 === This thesis is divided into two parts. The first part, we can use Hollow Cathode Chemical Vapor Deposition System which is established by our laboratory to deposit oxide under low temperature. We have found out the best parameter and analyzed the electrical chara...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/70311734422252212567 |