The study of poly silicone thin film process using excimer laser annealing and its characterization
碩士 === 國立高雄大學 === 電機工程學系--先進電子構裝技術產業研發碩 === 95 === In this thesis, the excimer laser annealing (ELA) process for polycrystalline silicon thin film by ArF (193nm) and KrF (248nm) excimer laser has been studied. Sample of amorphous silicon on p-type silicon (100) substrate was grown by CVD (Chemical v...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/60444558160677672823 |