The Study of Nano-scale Porous Silicon and Its surface Analysis
碩士 === 中國文化大學 === 材料科學與奈米科技研究所 === 95 === In this study、the porous silicon films are fabricated by chemical etching method. Via design of experimental method、the L18 matrix with the change of ionization current density、etching time、HF concentration、substrate type and with light or not were investiga...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/28014365395732170877 |