Thickness and refractive index measurements using Mirau interferometric microscope

碩士 === 國立臺北科技大學 === 光電工程系所 === 95 === With the improvement of fabrication in the semiconductor and MEMS (Micro-Electro-Mechanical Systems) field and the miniaturization of the device size, the requirement for the processing quality is stricter. Accordingly, it is necessary to conduct non-destructive...

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Bibliographic Details
Main Authors: Yin-Hao Lin, 林尹豪
Other Authors: 林世聰
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/2bm7ng