The effects of plasma pre-treatment and post-treatment on the diamond-like carbon films synthesized by RF plasma enhanced chemical vapor deposition

• Main Authors: Ying-Jie Wu, 吳英傑
• Other Authors: Shinn-Shyong Tzeng
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/zs66fm

碩士 === 大同大學 === 材料工程學系(所) === 95 === Diamond-like carbon (DLC) films were deposited by RF plasma enhanced chemical vapor deposition and the effects of pre-treatment and post-treatment of H2 or Ar plasma and the effects of C2H2/H2 and C2H2/Ar ratios on the structure and properties of DLC films were investigated. In the plasma pre-treatment, Ar plasma of different pressures and H2 plasma of different RF powers were used to modify the surface roughness of substrate. For the plasma post-treatment, the effects of post-treatment time and Ar/H2 ratio were studied. Deposition rate, surface roughness, nanohardness, young’s modulus, Raman analysis, residual stress and nano-wear depth of DLC films after various treatments were measured. Surface roughness characterized by AFM showed that plasma pre-treatment modified the substrate surface roughness, which will affect the roughness of the DLC films. However, the structure, hardness and residual stress of DLC films were not influenced by the plasma pre-treatment. For the DLC films deposited using different C2H2/Ar or C2H2/H2 ratios, it was found that as the C2H2/Ar or C2H2/H2 ratio was reduced, surface roughness, hardness and sp3/sp2 ratio decreased, and that the residual stress and the wear depth of the DLC films were also influenced by the C2H2/H2 ratio. For the Ar or H2 plasma post-treatment, surface roughness decreased with increasing treatment time. Hardness and the wear characteristics were also modified by the plasma post-treatment. However, the residual stress was independent of the Ar or H2 plasma post-treatment.