The study of Barium Strontium Titanate films on Si substrate with different buffer layers to fabricate MIS capacitor by RF-sputtering
碩士 === 國立雲林科技大學 === 電子與資訊工程研究所 === 95 === In this research, we deposit Barium Strontium Titanate film on Si substrate with different buffer layers by RF sputtering system. First, we deposit buffer layers of SiO2 and HfO2 on N-type Si substrate respectively. And then, BST film is deposited on Si subs...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/74494774844275383254 |