Characterization and Diagnosis of Plasma for Microwave Plasma-aided CVD
碩士 === 長庚大學 === 機械工程研究所 === 96 === Characterization and Diagnosis of Plasma for Microwave Plasma-aided CVD Abstract In the past few years, the plasma-aided chemical vapor deposition (CVD) has played an important role in many industrial fields of biotechnology, photoelectric, and semiconductor etc....
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/80199351897393591311 |