Application of Multivariable Run-to-run Control for Shallow Trench Isolation Process of Chemical Mechanical Polishing

碩士 === 長庚大學 === 化工與材料工程研究所 === 96 === Abstract The semiconductor manufacturing industry is arguably the fastest evolving major industry in the world. Success in the industry requires constant attention to the state of the art in process tool, process chemistries and physics, and technicians for proc...

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Bibliographic Details
Main Authors: Tzu How Cheng, 鄭子浩
Other Authors: G.B. Wang
Format: Others
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/24198274103785424832