Characteristics and Reliability of LTPS TFTs with Fluorinated High-K HfO2 Gate Dielectrics
碩士 === 長庚大學 === 光電工程研究所 === 96 === In this thesis, high-performance low-temperature polycrystalline silicon thin-film transistors (LTPS TFTs) integrated high-K HfO2 gate dielectric. We used various surface treatment techniques to improve HfO2/poly-Si interface properties. Therefore, we will compare...
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| Format: | Others |
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2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/67264592520423537831 |