Application of Nano-sphere Lithography on Nb superconducting devices

碩士 === 長庚大學 === 光電工程研究所 === 96 === Recently, nano-sphere lithography (NSL) becomes a wide-used technique to make nano-structure. Nano-sphere lithography is using 2-dimensional nano-sphere array as a mask to produce large area nano-structure through deposition or etching. This thesis is concentrated...

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Bibliographic Details
Main Authors: Cho Wei Chen, 陳焯煒
Other Authors: P. H. Chang
Format: Others
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/02578251963634502966