Development of Heat Transfer Simulation for Laser Annealing
碩士 === 長庚大學 === 電子工程學研究所 === 96 === Laser annealing process has been used for thin film transistor (TFT) technology. Simulation of laser annealing was developed to simulate temperature profile in planar and non-planar structures. For planar structures, temperature profile with excimer laser and co...
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| Format: | Others |
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2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/06768126107881360638 |