Development of Heat Transfer Simulation for Laser Annealing

• Main Authors: Ming-Che.Chiang, 江明澤
• Other Authors: R.D.Chang
• Format: Others
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/06768126107881360638

碩士 === 長庚大學 === 電子工程學研究所 === 96 === Laser annealing process has been used for thin film transistor (TFT) technology. Simulation of laser annealing was developed to simulate temperature profile in planar and non-planar structures. For planar structures, temperature profile with excimer laser and continuous wave laser(CW laser) were simulated. The simulation of excimer laser was used to examine the lift-off process of GaN. Annealing using CW laser was simulated to identify the process condition for improving grain size. For non-planar structures, two dimensional temperature profile with excimer laser was be simulated. The developed simulation platform for laser annealing is implemented in semiconductor process simulators. Therefore, the laser simulation can be performed with complex semiconductor processes and device structures.