Optical Emission Spectroscopic in PECVD ofMicrocrystalline Silicon and its Application in Soar cell Process
碩士 === 中原大學 === 化學工程研究所 === 96 === Deposition of microcrystalline silicon using VHF-GD (Very High Frequency-Glow Discharge) method was investigated. OES (Optical Emission Spectroscopy) was used to do real-time analysis on the Microcrystalline Si PECVD Process. The effects of operating parameters (po...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/qk4p72 |