Applying Virtual Metrology to the Control of Overlay Error in Lithography Process

碩士 === 中原大學 === 機械工程研究所 === 96 === In recent years, with the growing of LCD industry, display panel has become a major industry in Taiwan. This study explores the application of wavelet theory in the development of virtual metrology technique for overlay run-to-run control in the TFT-LCD lithography...

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Bibliographic Details
Main Authors: Chien-Hui Li, 李建輝
Other Authors: none
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/01358647070090248150