Dynamically Monitoring and Compensating the Thickness of Film using Turning Point Value Analysis－The Preliminary Simulation of Uniformity of Large-Area Ta2O5 Thin Film Deposited by RF Magnetron Sputtering
碩士 === 輔仁大學 === 物理學系 === 96 === The thickness of film has to reach the specific degree of uniformity, because it effects optical characteristic directly by itself. However, the bigger size of the substrate is, the harder demand of uniformity reach. The thesis mainly concerns the situation of the u...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/07958095493905949383 |