Studies of Silicon Oxynitride Thin Films Deposited by Ion Beam Sputtering
碩士 === 輔仁大學 === 物理學系 === 96 === Silicon oxynitride (SiOxNy) films have potential applications in silicon semiconductor, the micro-electronics and opto-electronics, and so on. The refractive indices of SiOxNy films can be varied from 1.47 (at 550 nm for silicon oxide) to 2.05 (at 550 nm for silicon...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/25901140901132016217 |