Process Design and Parameter Optimization on Nano Imprint

• Main Authors: Yin-Hao Chang, 鄭尹豪
• Other Authors: Jong-Zen Huang
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/22258969760049874938

碩士 === 華梵大學 === 機電工程學系博碩專班 === 96 === Because of the limitation arising from the expensive equipments and installments in the clean room, the reduction in feature size of the semiconductor, and the immense increase in R&D time and budget, the traditional manufacturing of the semiconductor have become unfavorable to the production and the bottleneck of the development in the future can be expected. Therefore, we started to look for a new manufacturing technology to satisfy the product requirements of the future. The “Nanoimprint” is one of the most costless and simplest manufacturing technologies; in addition, it has the advantage of mass production. This thesis focus on studying the Nanoimprinting related manufacturing technologies, especially the technology called “UV-Curing Roll to Roll Nanoimprint”, and looking into the good and bad of the forming effect after adjusting the parameters. The parameters mainly explored herein are UV glues, motor speed and the gap of adjutant roll. This thesis also discusses how the metal mold of the nanometer scale and the PDMS mold of the nanometer scale display its forming on the roll to roll nanoimprinting respectively. The forming effect are inspected, measured, and observed precisely by the alpha step, SEM, AFM and etc. different equipments and further analyzed and explored based on the photos and data resulting from such inspection and measurement.