Formation of nanostructure by self-assembled PS-b-PMMA block copolymer method for silicon nanowire solar cell applications
碩士 === 國立中興大學 === 光電工程研究所 === 96 === In this thesis, we discuss the method for optimizing the block copolymer thin film. Then, we achieve nanolithography by using the copolymer thin film on silicon wafer. Finally, we fabricate Cr and Al nanodot array on Si wafer. Our experiment result show that: in...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/63231412698157376885 |