Direct deposition of low temperature ZnO films on (11-20) sapphire substrates by atomic layer deposition
碩士 === 國立中興大學 === 物理學系所 === 96 === Zinc oxide (ZnO) films were directly grown on (11-20) sapphire substrates by atomic layer deposition (ALD) using diethylzinc (DEZn) and nitrous oxide (N2O) as precursors. Purified N2 was utilized to serve as carrier gas. Low-temperature (LT) ZnO films were deposite...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/79655085859863620466 |