Nanoindentation Behaviour and Annealed Microstructural Evolution of Ni/Si Thin Film

碩士 === 國立成功大學 === 機械工程學系碩博士班 === 96 === The study investigates the nano-mechanical properties of Ni/Si thin film using a nanoindentation technique. The effects of indentation depth and the annealing temperature on the microstructural evolution are also evaluated. The thin film is prepared by deposit...

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Bibliographic Details
Main Authors: Jyun-Ming Chen, 陳俊明
Other Authors: Woei-Shyan Lee
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/02582484961167890215