A Study on Microstructure and Mechanical Properties of Ti-Si-N Thin Flims by Reactive Co-sputtering
碩士 === 國立成功大學 === 機械工程學系碩博士班 === 96 === In this study, the nanocomposites of Ti-Si-N thin flims were prepared by reactive magnetron co-sputtering system and annealed by rapid thermal annealing (RTA) in 500℃. After annealing , the thin films were used to be examined thermal stability. The aim of arti...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/01839667425997009463 |