Gate Engineering of Advanced MOSFETs for Device Performance and Reliability Improvement
博士 === 國立交通大學 === 電子工程系所 === 96 === In this dissertation, we investigated the gate engineering integration for advanced device performance and reliability improvement including the comparison of STI-induced local uniaxial compressive stress in <110>- and <100>-channel directions, the use...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05842626356346191231 |