The Research of Metal-Insulator-Metal Capacitor Using High-k as Dielectrics for DRAM/RF Application
博士 === 國立交通大學 === 機械工程系所 === 96 === According to International Technology Roadmap for Semiconductors (ITRS), the continuous increasing capacitance density is required to scale down the device size of Metal-Insulator-Metal (MIM) capacitors that are widely used for Analog, RF and DRAM functions. To m...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/42045202868765770250 |