Process Control for Photolithography Using Kalman Filter and Minimum Variance Controller
碩士 === 國立交通大學 === 工學院半導體材料與製程產業專班 === 96 === This thesis presents a new run-to-run (R2R) controller for photolithography process. The controller, termed Kalman minimum variance controller, can act both as a dynamical model optimizer and as a controller for given models. In this thesis, the relations...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/4hr4db |