Advanced Process Control for PECVD Equipment Using Kalman Filter and Minimum Variance Controller

碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 96 === This thesis proposes an advanced process controller which combines kalman filter and Minimum Variance Controller (MVC) to improve the process variance of Pad-Boron Silicon Glass (Pad-BSG) of Plasma Enhanced-Chemical Vapor Deposition (PE-CVD) process....

Full description

Bibliographic Details
Main Authors: Chao-An Lee, 李昭安
Other Authors: An-Chen Lee
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/21360849871474412621